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Gas Sources in Vacuum - Thin Film Materials Processing - Lecture Slides, Slides of Material Engineering

These are the Lecture Slides of Thin Film Materials Processing which includes Vaporization, Vapor Pressure Curves, Thermal Desorption, Molecular Binding Energy, First Order Desorption, Desorption Rate, Real Surfaces, Diffusion of Gas Particles etc. Key important points are: Gas Sources in Vacuum, Vaporization, Vapor Pressure Curves, Thermal Desorption, Molecular Binding Energy, First Order Desorption, Desorption Rate, Real Surfaces, Diffusion of Gas Particles

Typology: Slides

2012/2013

Uploaded on 03/21/2013

dheer
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Page 1
Vacuum Technology
Page 2
Gas Sources in a Vacuum
Vaporization
Thermal Desorption
•Diffusion
Permeation
Backstreaming
•Leaks
Real
Virtual Pump
Permeation Real
leak
Virtual
leak
Vaporization
Desorption
Diffusion
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Page 1

Vacuum Technology

Page 2

Gas Sources in a Vacuum

• Vaporization

• Thermal Desorption

• Diffusion

• Permeation

• Backstreaming

• Leaks

– Real

– Virtual Pump

Permeation Real leak

Virtual leak

Vaporization

Desorption

Diffusion

Page 3

Vaporization

• Particle Flux (Γ) (from before)

• Similarly for Vaporization of a solid source

(or evaporation)

1 / 2

m

kT

n

π

T Temperatur e

M Molecularweight

A SurfaceArea

P VaporPressure

( /sec) 2. 6310241 / 2

Γ = × ×

where

MT

PA

molecules

Vaporization

Vacuum Technology

Page 4

Vapor Pressure Curves

Page 7

Thermal Desorption

• Heat stimulated release of gases or vapors

previously adsorbed on the surface of the

chamber walls

  • Function of:
    • Molecular binding energy
    • Temperature of the surface
    • Number of monolayers formed on the surface

Desorption

Vacuum Technology

Page 8

Thermal Desorption

• First Order Desorption

  • Atoms or molecules that do not dissociate prior to desorption

1/vibrationalfrequency(~ 10 sec)

desorptionenergy

rate constant

asafunctionoftime)

desorptionrate(concentration

exp ()

  • 12 0

1

0

0 1

τ

τ

D

D

E

K

dt

dCt

where

Ct NkT

E

KCt dt

dCt

moleculespendsona surface

averageresidencetimea

:

exp

(^11) exp

R

(^00)

1 0 0

=

= −

= −

τ

τ τ

τ

where

NkT

E

NkT

E K

R D

D

Integration

C concentrationat t 0

exp( ) exp( / )

0

1 0 1 0 1

= =

where

KC Kt CK t dt

dC t

τ R

Page 9

Thermal Desorption

• Temperature dependence of average

residence time (τR )

10

1000

100000

1E+

1E+

1E+

1E+

0 100 200 300 400 500 600

Temperature (K)

Average residence time (s)

H2O-metal ( MJ/kg-mol)

Vacuum Technology

Page 10

First Order Desorption

• Desorption Rate vs Time

1 0 50000 100000 150000 200000

Time (seconds)

Desorption rate (molecules/sec)

1st order BE=96MJ 1st order BE=192MJ

Page 13

First and Second Order Desorption Rate

• Desorption rate vs Time

1 0 50000 100000 150000 200000

Time (seconds)

Desorption rate (molecules/sec)

1st order BE=96MJ 1st order BE=192MJ 2nd order BE=96MJ 2nd order BE=192MJ

Vacuum Technology

Page 14

Real Surfaces

• Must consider multiple binding energies

  • Particle - surface BE
  • Particle - particle BE (for > 1 monolayer)
  • Particle - particle BE changes as a function of the surface coverage

Surface (^) Surface Surface

Most systems: outgassing rate ∝ 1/t

Page 15

Diffusion

• Diffusion of gas particles inside chamber

wall to the interior of the chamber

– 2 step process

  • Diffusion of gas to the interior of chamber surface
  • Desorption of diffused species

– Diffusion << slower than desorption, therefore

diffusion is the rate limiting step

External Surface P >> Co

Internal Surface P < Co

Vacuum Technology

Page 16

Diffusion

  • Outgassing rate (q) [Pressure-volume/sec)/surface area] ie

{(Torr-liters/s)/m^2 ]

d thicknessofthewall

D diffusioncoefficient

initialconcentrationofgasinsolidwall

1 2 ( 1 ) exp

0

1 / (^22)

0

=∞

=

C

where

Dt

nd

t

D

q C

n n

n o

Page 19

Permeation

• Three step process

– Gas adsorbs onto outer wall of vacuum

chamber

– Gas diffuses through chamber wall

– Gas desorbs from interior of chamber wall

• Permeability of a wall (K P)

– KP = DS’ where:

  • D = diffusion coefficient
  • S’ is the solid solubility of the gas in the chamber material

Vacuum Technology

Page 20

Permeation

Permeation

rate

time

Crossover point= d^2 /6D (time to reach Equilibrium for a chamber wall initially devoid of any gas)

Permeation Rate

d chamber wall thickness

P pressuredropacrosschamber wall

permeationofthewall

Kp

where

d

K P

q P^ Stainless Steel – H 2

Glass -- Helium

Page 21

Big Picture

Time (s)

Pressure

(Torr)

Volume ~ exp(-t)

Outgassing ~ t-

Diffusion ~ t-1/ Permeation